IN625 Nickel Base Alloy Powder Inconel 625 Pulvis
depictio producti
Huarui caliditas nickel-fundatur mixtura IN625 pulveris est optimized pulveris, maxime apta ad technologiam SLM formandam, inter EOS selectivam Laser Equipment (EOSINT M Series), Conceptus Laser Equipment, Renishaw Laser Aequipmentum, Laser 3D Systems American Equipmentum liquescens, ac domesticae inquisitionis Instituta et Instituta.
Per variam quantitatem particulae distributionem, etiam in iniectionem pulveris coronae subdividi potest, pulveris cladding laser, pulveris spargit, pulveris impressi isostatic calidum et cetera.
Specification
| Chemical Compositio (%) Inconel 625 Pulvis | ||||||
| Cr | Co | Al | Mo | Mn | Ti | Nb |
| 20-23 | ≤1.0 | ≤0.4 | 8.0-10 | ≤0.5 | ≤0.4 | 3.15-4.15 |
| Fe | C | Si | P | S | O | Ni |
| ≤0.5 | ≤0.1 | ≤0.5 | ≤0.015 | ≤0.15 | ≤0.02 | Bal |
| Densitas apparentis: 4.50g/cm3 | Color: griseo | Figura: sphaericum | ||||
| Magnitudo particula | 15-53micron;45-105micron;45-150micron | |||||
| Inconel 625 pulveris Properties | ||||||
| Magnitudo dolor | 0~25um | 0~45um | 15~45um | 45~105um | 75~ 180um | |
| Morphologia | Sphaericus | Sphaericus | Sphaericus | Sphaericus | Sphaericus | |
| Particula Size Distributio | D10: 6um | D10: 9um | D10: 14um | D10: 53um | D10: 78um | |
| D50:16um | D50: 28um | D50: 35um | D50: 69um | D50: 120um | ||
| D90: 23um | D90: 39um | D90: 45um | D90: 95um | D90: 165um | ||
| Influunt facultatem | N/A | ≤30S | ≤28S | ≤16S | ≤18S | |
| Apparens densitas | 4.2g/cm3 | 4.5g/cm3 | 4.4g/cm3 | 4.5g/cm3 | 4.4g/cm3 | |
| Oxygen Content (wt%) | O: 0.06~0.018wt% , ASTM standard : ≤0.02 wt% | |||||
| 3D excudendi Gas Atomized Inconel DCXXV pulveris cum optimo pretio | ||||||
| (humilis dolor, sphaericitas alta et fluiditas bona) | ||||||
Applicationem
1. HVOF
2. Plasma coating
3. 3D excudendi / ELOGIUM vestibulum
4. pulveris glutino
5. Iniectio metalli
6. calidum isostatic
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